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US08174089B2 High voltage switching devices and process for forming same 有权
高压开关器件及其形成工艺

High voltage switching devices and process for forming same
Abstract:
The present invention relates to various switching device structures including Schottky diode, P—N diode, and P—I—N diode, which are characterized by low defect density, low crack density, low pit density and sufficient thickness (>2.5 um) GaN layers of low dopant concentration ( 2 KV).
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