Invention Grant
US08174165B2 Surface acoustic wave device and manufacturing method of the same surface acoustic wave device 有权
声表面波装置及相同声表面波装置的制造方法

Surface acoustic wave device and manufacturing method of the same surface acoustic wave device
Abstract:
A surface acoustic wave device includes a piezoelectric element, an IDT electrode formed on the piezoelectric element for exciting a principal wave, a reflection film formed on the piezoelectric element having a higher reflectivity than the reflectivity of the piezoelectric element in a visible light wavelength region, and a light permeable dielectric layer formed on the piezoelectric element, at least a part of the IDT electrode, and the reflection film. Accordingly, when measuring the film thickness of the light permeable dielectric layer by light interference method, the reflected light from the reflection film having a higher reflectivity than the reflectivity of the piezoelectric element in a visible light wavelength region can be utilized, so that the film thickness can be measured more accurately.
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