Invention Grant
- Patent Title: Sample stage apparatus and method of controlling the same
- Patent Title (中): 样品台装置及其控制方法
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Application No.: US12420358Application Date: 2009-04-08
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Publication No.: US08174229B2Publication Date: 2012-05-08
- Inventor: Masashi Fujita , Shuichi Nakagawa , Takashi Kobayashi
- Applicant: Masashi Fujita , Shuichi Nakagawa , Takashi Kobayashi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2008-100654 20080408
- Main IPC: B64C17/06
- IPC: B64C17/06

Abstract:
The present invention provides a stage apparatus capable of reducing a positioning time without increasing a positional deviation. A positioning control method of a sample stage apparatus includes: a high-speed movement step of moving a table to a high-speed movement target position at a first movement speed; a positional deviation correcting step of moving the table to a low-speed positioning step start position at a second movement speed that is lower than the first movement speed; a low-speed positioning step of moving the table to a target position at a third movement speed that is lower than the second movement speed. After the low-speed positioning step is completed, a rod connected to a motor returns to its original position to separate a pin of the rod side from a concave portion of the table side.
Public/Granted literature
- US20090251091A1 SAMPLE STAGE APPARATUS AND METHOD OF CONTROLLING THE SAME Public/Granted day:2009-10-08
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