Invention Grant
- Patent Title: Analysis of a material with capacitive technology
- Patent Title (中): 用电容技术分析材料
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Application No.: US12343227Application Date: 2008-12-23
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Publication No.: US08174272B2Publication Date: 2012-05-08
- Inventor: Divyasimha Harish
- Applicant: Divyasimha Harish
- Applicant Address: US CA Fremont
- Assignee: YPoint Capital, Inc.
- Current Assignee: YPoint Capital, Inc.
- Current Assignee Address: US CA Fremont
- Agent Rai Abhyanker
- Main IPC: G01R27/26
- IPC: G01R27/26

Abstract:
Several apparatuses and a method for enabling of analysis of a material based on capacitive technology are disclosed. In an embodiment, the apparatus includes a first conductive surface. A second conductive surface is located substantially parallel to the first conductive surface. A measurement module measures a change in capacitance produced when a material is passed between the first conductive surface and the second conductive surface. The apparatus may include a database comprising a capacitance value of the material. A change in capacitance may be compared to the database to generate an identity of the material. A reference capacitor may enable the measurement module to adjust the measurement based on an environmental condition.
Public/Granted literature
- US20090160460A1 ANALYSIS OF A MATERIAL WITH CAPACITIVE TECHNOLOGY Public/Granted day:2009-06-25
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