Invention Grant
- Patent Title: Environment mapping
- Patent Title (中): 环境映射
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Application No.: US12842353Application Date: 2010-07-23
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Publication No.: US08174527B2Publication Date: 2012-05-08
- Inventor: Mark Evan Cerny , Pal-Kristian Engstad
- Applicant: Mark Evan Cerny , Pal-Kristian Engstad
- Applicant Address: US CA Foster City
- Assignee: Sony Computer Entertainment America LLC
- Current Assignee: Sony Computer Entertainment America LLC
- Current Assignee Address: US CA Foster City
- Agency: Lewis and Roca LLP
- Main IPC: G06T15/50
- IPC: G06T15/50

Abstract:
A system and method for environment mapping determines a computer-generated object's reflective appearance, based upon position and orientation of a camera with respect to the object's location. An embodiment of the present invention is implemented as a real-time environment mapping for polygon rendering, however, the scope of the invention covers other rendering schemes. According to one embodiment of the present invention, a vector processing unit (VPU) uses a modified reflection formula—r=e−(e·(n+eo))(n+eo)/(1−nz)=e−(e·[nx, ny, nz−1])[nx, ny, nz−1]/(1−nz), wherein eo=[0,0,−1], and nx, ny, and nz are the components of the surface normal vector n—to compute reflective properties of an object.
Public/Granted literature
- US20100283783A1 Environment Mapping Public/Granted day:2010-11-11
Information query
IPC分类:
G | 物理 |
G06 | 计算;推算或计数 |
G06T | 一般的图像数据处理或产生 |
G06T15/00 | 3D〔三维〕图像的加工 |
G06T15/50 | .发光效果 |