Invention Grant
- Patent Title: Alignment tolerant patterning on flexible substrates
- Patent Title (中): 柔性基板上的对准容限图案化
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Application No.: US11720425Application Date: 2005-12-02
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Publication No.: US08174634B2Publication Date: 2012-05-08
- Inventor: Henning Sirringhaus , Seamus Burns
- Applicant: Henning Sirringhaus , Seamus Burns
- Applicant Address: GB Cambridge
- Assignee: Plastic Logic Limited
- Current Assignee: Plastic Logic Limited
- Current Assignee Address: GB Cambridge
- Agency: Knobbe, Martens Olson & Bear LLP
- Priority: GB0426563.3 20041203; GB0510173.8 20050519
- International Application: PCT/GB2005/050231 WO 20051202
- International Announcement: WO2006/059162 WO 20060608
- Main IPC: G02F1/136
- IPC: G02F1/136

Abstract:
A method is provided for fabricating a multilayer electronic device on a flexible substrate including at least a first and a second patterned layer, wherein the first patterned layer is defined with a linewidth that is smaller than the linewidth of the second patterned layer, and the second patterned layer is defined by a patterning technique which is capable of correcting for local distortions of the pattern of said first layer on top of the flexible substrate and wherein the first patterned layer is laid-out in such a way that the geometric overlap between a portion of the second layer and a portion of the first layer is insensitive against small variations of the position of the second patterned layer.
Public/Granted literature
- US20080265244A1 Alignment Tolerant Patterning on Flexible Substrates Public/Granted day:2008-10-30
Information query
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