Invention Grant
- Patent Title: Thin-film transistor substrate comprising a repair pattern
- Patent Title (中): 包括修复图案的薄膜晶体管基板
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Application No.: US12405657Application Date: 2009-03-17
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Publication No.: US08174637B2Publication Date: 2012-05-08
- Inventor: Yong-Eun Park
- Applicant: Yong-Eun Park
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2008-0024434 20080317
- Main IPC: G02F1/1333
- IPC: G02F1/1333 ; G02F1/1343 ; G02F1/13

Abstract:
A thin-film transistor substrate includes; gate lines which extend in a first direction, the gate lines including a first gate line and a second gate line, the first gate line disposed adjacent to and previous to the second gate line, data lines which are insulated from the gate lines and extend in a second direction perpendicular to the first direction, a pixel electrode formed in a region where the first gate line and the second gate lines cross the data lines and connected to the second gate line, and a repair pattern which at least partially overlaps the first gate line, the repair pattern comprising a plurality of connection patterns, wherein the connection patterns extend from the pixel electrode in the second direction toward the first gate line, have a predetermined width measured in the first direction, and are arranged at predetermined intervals along the first direction.
Public/Granted literature
- US20090230398A1 THIN-FILM TRANSISTOR SUBSTRATE AND METHOD OF REPAIRING THE SAME Public/Granted day:2009-09-17
Information query
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