Invention Grant
- Patent Title: Liquid immersion optical tool, method for cleaning liquid immersion optical tool, liquid immersion exposure method and method for manufacturing semiconductor device
- Patent Title (中): 液浸式光学工具,液浸式光学工具的清洗方法,液浸式曝光方法及半导体装置的制造方法
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Application No.: US12510009Application Date: 2009-07-27
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Publication No.: US08174669B2Publication Date: 2012-05-08
- Inventor: Tatsuhiko Higashiki , Hiroshi Tomita
- Applicant: Tatsuhiko Higashiki , Hiroshi Tomita
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2004-258676 20040906
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42

Abstract:
There is disclosed is a liquid immersion optical tool, which comprises a light source, an optical lens system, a stage which moves an object base on which an object is to be placed, a head comprising a liquid immersion medium fluid supply device and a liquid immersion medium fluid discharge device to provide a layer of liquid immersion medium fluid between the optical lens system and the object, a fence which limits a region of the layer of liquid immersion medium fluid, and a cleaning device which cleans a portion having been contacted with the liquid immersion medium fluid by means of a cleaning solution.
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