Invention Grant
- Patent Title: Measurement method and exposure apparatus
- Patent Title (中): 测量方法和曝光装置
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Application No.: US12419931Application Date: 2009-04-07
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Publication No.: US08174670B2Publication Date: 2012-05-08
- Inventor: Taro Tezuka , Yoshiyuki Kuramoto
- Applicant: Taro Tezuka , Yoshiyuki Kuramoto
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc IP Division
- Priority: JP2008-114415 20080424
- Main IPC: G03B27/68
- IPC: G03B27/68

Abstract:
A method of measuring an optical characteristic of an optical system using a measurement apparatus, comprises determining a position of each of object points by arranging, on a side of the object plane, an object point measurement device array, and sequentially inserting the object point measurement devices in an optical path, determining a position of each of image points by arranging, on a side of the image plane, an image point measurement device array, and sequentially inserting the image point measurement devices in the optical path, calculating an error attributed to the measurement apparatus based on the positions of object points and the positions of the image points, obtaining a measured value by measurement to obtain information representing the optical characteristic of the optical system using the measurement apparatus, and correcting the measured value based on the error.
Public/Granted literature
- US20090268181A1 MEASUREMENT METHOD AND EXPOSURE APPARATUS Public/Granted day:2009-10-29
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