Invention Grant
- Patent Title: Measuring apparatus, optical system manufacturing method, exposure apparatus, device manufacturing method, and processing apparatus
- Patent Title (中): 测量装置，光学系统制造方法，曝光装置，装置制造方法和处理装置
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Application No.: US12840951Application Date: 2010-07-21
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Publication No.: US08174675B2Publication Date: 2012-05-08
- Inventor: Takeshi Suzuki , Yoshiyuki Kuramoto
- Applicant: Takeshi Suzuki , Yoshiyuki Kuramoto
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2009-177028 20090729
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
The present invention provides a processing apparatus which executes sampling of data and represents the sampled data by linear combination of orthogonal functions, the apparatus including a device configured to execute the sampling, and a processor configured to process the data sampled by the device, wherein the processor is configured, if the data sampled by the device includes an invalid sampling point, to obtain a degree of break of orthogonality of an orthogonal function system caused by the invalid sampling point, and to evaluate reliability of the sampling based on the obtained degree.
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