Invention Grant
- Patent Title: Illumination optical system for microlithography
- Patent Title (中): 用于微光刻的照明光学系统
-
Application No.: US12233914Application Date: 2008-09-19
-
Publication No.: US08174677B2Publication Date: 2012-05-08
- Inventor: Jens Ossmann , Martin Endres , Ralf Stuetzle
- Applicant: Jens Ossmann , Martin Endres , Ralf Stuetzle
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102007048467 20071009
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/70 ; G02B5/08
Abstract:
The disclosure provides an illumination optical system for microlithography that is designed so that, even with a change of illumination setting (e.g., a change in the given illumination conditions in the object field), variation of illumination parameters over the object field is confined within predetermined tolerances.
Public/Granted literature
- US20090091731A1 ILLUMINATION OPTICAL SYSTEM FOR MICROLITHOGRAPHY Public/Granted day:2009-04-09
Information query
