Invention Grant
US08174678B2 Lithographic apparatus with adjusted exposure slit shape enabling reduction of focus errors due to substrate topology and device manufacturing method
有权
具有调节曝光狭缝形状的平版印刷设备，其能够减少由于衬底拓扑和器件制造方法引起的焦点误差
- Patent Title: Lithographic apparatus with adjusted exposure slit shape enabling reduction of focus errors due to substrate topology and device manufacturing method
- Patent Title (中): 具有调节曝光狭缝形状的平版印刷设备，其能够减少由于衬底拓扑和器件制造方法引起的焦点误差
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Application No.: US12329076Application Date: 2008-12-05
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Publication No.: US08174678B2Publication Date: 2012-05-08
- Inventor: Sven Gunnar Krister Magnusson , Martin Jules Marie-Emile De Nivelle , Frank Staals , Wim Tjibbo Tel
- Applicant: Sven Gunnar Krister Magnusson , Martin Jules Marie-Emile De Nivelle , Frank Staals , Wim Tjibbo Tel
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/32
Abstract:
A lithographic apparatus includes an illumination system to condition a radiation beam; a patterning device support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, and a projection system to project the patterned radiation beam in a scanning exposure along a scanning direction onto a target portion of the substrate. The illumination system is configured to form in a plane of the patterning device a slit shaped image. The slit shaped image has a curved shape with a slit curvature in the scanning direction, with a length in the scanning direction and a width perpendicular to the scanning direction. The slit shaped image is configured to create a curved pattern image portion of the patterned radiation beam in an image plane of the projection system.
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