Invention Grant
- Patent Title: Wavelength determining apparatus, method and program for thin film thickness monitoring light
- Patent Title (中): 用于薄膜厚度监测光的波长确定装置，方法和程序
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Application No.: US12843453Application Date: 2010-07-26
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Publication No.: US08174757B2Publication Date: 2012-05-08
- Inventor: Takahiro Itoh , You Mimura
- Applicant: Takahiro Itoh , You Mimura
- Applicant Address: JP
- Assignee: The Furukawa Electric Co., Ltd.
- Current Assignee: The Furukawa Electric Co., Ltd.
- Current Assignee Address: JP
- Agency: Cantor Colburn LLP
- Priority: JP2002-000115 20020104; JP2002-000143 20020104; JP2002-007901 20020116
- Main IPC: H01S3/00
- IPC: H01S3/00
Abstract:
A multi-layer optical thin film filter comprising plural deposited optical thin films, wherein optical thin film thickness for each of said optical thin films has a predetermined wavelength spectrum in a predetermined gain equalization band and a predetermined wavelength spectrum in a pumping light transmission band other than said gain equalization band.
Public/Granted literature
- US20100284062A1 WAVELENGTH DETERMINING APPARATUS, METHOD AND PROGRAM FOR THIN FILM THICKNESS MONITORING LIGHT Public/Granted day:2010-11-11
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