Invention Grant
- Patent Title: Method for compensating for variations in structures of an integrated circuit
- Patent Title (中): 补偿集成电路结构变化的方法
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Application No.: US12208521Application Date: 2008-09-11
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Publication No.: US08176446B2Publication Date: 2012-05-08
- Inventor: Santo Credendino , Michael D. Hulvey , Jothimalar Kuppusamy , Robert Kenneth Leidy , Paul William Pastel , Bruce Walter Porth , Anthony K. Stamper
- Applicant: Santo Credendino , Michael D. Hulvey , Jothimalar Kuppusamy , Robert Kenneth Leidy , Paul William Pastel , Bruce Walter Porth , Anthony K. Stamper
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts
- Agent Richard Kotulak
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) applying a rules-based optical proximity correction to the selected region of the mask design shape.
Public/Granted literature
- US20100064273A1 Method for Compensating for Variations in Structures of an Integrated Circuit Public/Granted day:2010-03-11
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