Invention Grant
- Patent Title: Optical device wafer processing method
- Patent Title (中): 光器件晶圆加工方法
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Application No.: US13011266Application Date: 2011-01-21
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Publication No.: US08178425B2Publication Date: 2012-05-15
- Inventor: Tasuku Koyanagi , Hiroshi Morikazu
- Applicant: Tasuku Koyanagi , Hiroshi Morikazu
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer, Burns & Crain, Ltd.
- Priority: JP2010-024543 20100205
- Main IPC: H01L21/46
- IPC: H01L21/46 ; H01L21/78 ; H01L21/301

Abstract:
An optical device wafer processing method for dividing an optical device wafer into a plurality of individual optical devices. The optical device wafer is composed of a substrate and a semiconductor layer formed on the front side of the substrate. The optical devices are partitioned by a plurality of crossing division lines formed on the semiconductor layer. The optical device wafer processing method includes a division start point forming step of applying a laser beam having a transmission wavelength to the substrate to the intersections of the crossing division lines in the condition where the focal point of the laser beam is set inside the substrate in an area corresponding to the intersections of the crossing division lines, thereby forming a plurality of modified dots as division start points inside the substrate at the intersections of the crossing division lines; and a crack growing step of applying a CO2 laser beam along the division lines to grow cracks inside the substrate from the division start points.
Public/Granted literature
- US20110195535A1 OPTICAL DEVICE WAFER PROCESSING METHOD Public/Granted day:2011-08-11
Information query
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