Invention Grant
- Patent Title: Thermal flux processing by scanning a focused line beam
- Patent Title (中): 通过扫描聚焦线束进行热通量处理
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Application No.: US11079785Application Date: 2005-03-14
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Publication No.: US08178819B2Publication Date: 2012-05-15
- Inventor: Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
- Applicant: Dean C. Jennings , Mark Yam , Abhilash J. Mayur , Vernon Behrens , Paul A. O'Brien , Leonid M. Tertitski , Alexander Goldin
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agent Charles S. Guenzer
- Main IPC: B23K26/08
- IPC: B23K26/08 ; B23K26/10

Abstract:
The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.
Public/Granted literature
- US20050218124A1 Thermal flux processing by scanning a focused line beam Public/Granted day:2005-10-06
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