Invention Grant
- Patent Title: GaN-based semiconductor element
- Patent Title (中): GaN基半导体元件
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Application No.: US12535071Application Date: 2009-08-04
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Publication No.: US08178898B2Publication Date: 2012-05-15
- Inventor: Nariaki Ikeda , Seikoh Yoshida
- Applicant: Nariaki Ikeda , Seikoh Yoshida , Masatoshi Ikeda, legal representative
- Applicant Address: JP Tokyo
- Assignee: Furukawa Electric Co., Ltd.
- Current Assignee: Furukawa Electric Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Lowe, Hauptman, Ham & Berner, LLP
- Priority: JP2007-076004 20070323
- Main IPC: H01L29/205
- IPC: H01L29/205

Abstract:
A GaN-based semiconductor element includes a substrate, a buffer layer formed on the substrate, including an electrically conductive portion, an epitaxial layer formed on the buffer layer, and a metal structure in ohmic contact with the electrically conductive portion of the buffer layer for controlling an electric potential of the buffer layer.
Public/Granted literature
- US20100032683A1 GaN-BASED SEMICONDUCTOR ELEMENT Public/Granted day:2010-02-11
Information query
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