Invention Grant
- Patent Title: Electrostatic discharge protection circuit
- Patent Title (中): 静电放电保护电路
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Application No.: US12536378Application Date: 2009-08-05
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Publication No.: US08178948B2Publication Date: 2012-05-15
- Inventor: Jae-Young Park , Jong-Kyu Song , San-Hong Kim
- Applicant: Jae-Young Park , Jong-Kyu Song , San-Hong Kim
- Applicant Address: KR Seoul
- Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Sherr & Vaughn, PLLC
- Priority: KR10-2008-0081275 20080820
- Main IPC: H01L27/06
- IPC: H01L27/06 ; H01L21/8222

Abstract:
An electrostatic discharge (ESD) protection circuit includes a substrate, and a plurality of unit bipolar transistors formed in the substrate. Each of the plurality of unit bipolar transistors may include a first-conductivity-type buried layer formed in the substrate, a first-conductivity-type well formed over the first-conductivity-type buried layer, a second-conductivity-type well formed in the first-conductivity-type well, a first-conductivity-type vertical doping layer vertically formed from the surface of the substrate to the first-conductivity-type buried layer so as to surround the first-conductivity-type well, and a first-conductivity-type doping layer and a second conductivity-type doping layer formed in the second-conductivity-type well. The first-conductivity-type doping layer of any one of the adjacent unit bipolar transistors and the first-conductivity-type vertical doping layer of another one of the adjacent unit bipolar transistors may be connected to each other.
Public/Granted literature
- US20100044834A1 ELECTROSTATIC DISCHARGE PROTECTION CIRCUIT Public/Granted day:2010-02-25
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