Invention Grant
- Patent Title: Bond pad structure
- Patent Title (中): 焊盘结构
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Application No.: US12026312Application Date: 2008-02-05
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Publication No.: US08178980B2Publication Date: 2012-05-15
- Inventor: Shin-Puu Jeng , Yu-Wen Liu , Hao-Yi Tsai , Hsien-Wei Chen
- Applicant: Shin-Puu Jeng , Yu-Wen Liu , Hao-Yi Tsai , Hsien-Wei Chen
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L29/40
- IPC: H01L29/40

Abstract:
A bonding pad structure is provided that includes two conductive layers and a connective layer interposing the two conductive layers. The connective layer includes a contiguous, conductive structure. In an embodiment, the contiguous conductive structure is a solid layer of conductive material. In other embodiments, the contiguous conductive structure is a conductive network including, for example, a matrix configuration or a plurality of conductive stripes. At least one dielectric spacer may interpose the conductive network. In an embodiment, the conductive density of the connective layer is between approximately 20% and 100%.
Public/Granted literature
- US20090194889A1 BOND PAD STRUCTURE Public/Granted day:2009-08-06
Information query
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