Invention Grant
- Patent Title: Helicon plasma source with permanent magnets
- Patent Title (中): Helicon等离子源与永磁体
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Application No.: US12003330Application Date: 2007-12-21
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Publication No.: US08179050B2Publication Date: 2012-05-15
- Inventor: Francis F. Chen
- Applicant: Francis F. Chen
- Applicant Address: US CA Oakland
- Assignee: The Regents Of The University of California
- Current Assignee: The Regents Of The University of California
- Current Assignee Address: US CA Oakland
- Agency: Venable LLP
- Agent Henry J. Daley
- Main IPC: H01J7/24
- IPC: H01J7/24
Abstract:
A helicon plasma source has a discharge tube, a radio frequency antenna disposed proximate the discharge tube, and a permanent magnet positioned with respect to the discharge tube so that the discharge tube is in a far-field region of a magnetic field produced by the permanent magnet.
Public/Granted literature
- US20080246406A1 Helicon plasma source with permanent magnets Public/Granted day:2008-10-09
Information query
