Invention Grant
US08179520B2 Optical element, projection optical system, exposure apparatus, and device fabrication method 失效
光学元件,投影光学系统,曝光装置和器件制造方法

Optical element, projection optical system, exposure apparatus, and device fabrication method
Abstract:
The present invention provides an optical element which is used for light having a wavelength not more than 250 nm, and receives a light beam at a maximum incident angle not less than 55°, wherein the optical element includes an optical thin film in an effective aperture thereof, and a film thickness distribution of the optical thin film in the effective aperture includes a distribution in which a thickness of the optical thin film in an outermost periphery of the effective aperture is 1.10 times (inclusive) to 1.25 times (inclusive) a thickness of the optical thin film at a midpoint between an optical axis and the outermost periphery of the effective aperture.
Information query
Patent Agency Ranking
0/0