Invention Grant
US08179520B2 Optical element, projection optical system, exposure apparatus, and device fabrication method
失效
光学元件,投影光学系统,曝光装置和器件制造方法
- Patent Title: Optical element, projection optical system, exposure apparatus, and device fabrication method
- Patent Title (中): 光学元件,投影光学系统,曝光装置和器件制造方法
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Application No.: US12399587Application Date: 2009-03-06
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Publication No.: US08179520B2Publication Date: 2012-05-15
- Inventor: Takumi Tokimitsu
- Applicant: Takumi Tokimitsu
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc., IP Division
- Priority: JP2008-058702 20080307
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G02B5/30

Abstract:
The present invention provides an optical element which is used for light having a wavelength not more than 250 nm, and receives a light beam at a maximum incident angle not less than 55°, wherein the optical element includes an optical thin film in an effective aperture thereof, and a film thickness distribution of the optical thin film in the effective aperture includes a distribution in which a thickness of the optical thin film in an outermost periphery of the effective aperture is 1.10 times (inclusive) to 1.25 times (inclusive) a thickness of the optical thin film at a midpoint between an optical axis and the outermost periphery of the effective aperture.
Public/Granted literature
- US20090225298A1 OPTICAL ELEMENT, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD Public/Granted day:2009-09-10
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