Invention Grant
US08179622B2 Photosensitive transfer material, member for display device, process for producing the member, black matrix, color filter, process for producing the color filter, substrate for display device, and display device
有权
感光转印材料，显示装置用构件，制造构件的方法，黑矩阵，滤色器，滤色器的制造工序，显示装置用基板，显示装置
- Patent Title: Photosensitive transfer material, member for display device, process for producing the member, black matrix, color filter, process for producing the color filter, substrate for display device, and display device
- Patent Title (中): 感光转印材料，显示装置用构件，制造构件的方法，黑矩阵，滤色器，滤色器的制造工序，显示装置用基板，显示装置
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Application No.: US12158578Application Date: 2006-12-06
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Publication No.: US08179622B2Publication Date: 2012-05-15
- Inventor: Hidenori Gotoh
- Applicant: Hidenori Gotoh
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2005-370822 20051222
- International Application: PCT/JP2006/324352 WO 20061206
- International Announcement: WO2007/072682 WO 20070628
- Main IPC: G02B5/22
- IPC: G02B5/22 ; G02F1/1335
Abstract:
A photosensitive transfer material including, on or above a temporary support, in the following order from the temporary support side, at least a thermoplastic resin layer and a photosensitive resin layer, wherein the tensile elongation at break of the thermoplastic resin layer is 6% or more, the yield stress or breaking strength thereof is 5×106 Pa or more, and the melt viscosity η at 110° C. thereof is 6000 Pa·s or less.
Public/Granted literature
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