Invention Grant
- Patent Title: Electronic device and method for manufacturing the same
- Patent Title (中): 电子设备及其制造方法
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Application No.: US11935854Application Date: 2007-11-06
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Publication No.: US08179660B2Publication Date: 2012-05-15
- Inventor: Hiroshi Katsube , Jun Nishikawa
- Applicant: Hiroshi Katsube , Jun Nishikawa
- Applicant Address: JP Nagaokakyo-Shi, Kyoto-fu
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Nagaokakyo-Shi, Kyoto-fu
- Agency: Dickstein Shapiro LLP
- Priority: JP2005-164841 20050306
- Main IPC: H01G4/00
- IPC: H01G4/00

Abstract:
A highly reliable electronic device that prevents entry of a plating solution via an external electrode and entry of moisture of external environment inside thereof, and generates no soldering defects or solder popping defects which are caused by precipitation of a glass component on a surface of the external electrode. The electrode structure of the electronic device is formed of Cu-baked electrode layers primarily composed of Cu, Cu plating layers formed on the Cu-baked electrode layers and which are processed by a recrystallization treatment, and upper-side plating layers formed on the Cu plating layers. After the Cu plating layers are formed, a heat treatment is performed at a temperature in the range of a temperature at which the Cu plating layers are recrystallized to a temperature at which glass contained in a conductive paste is not softened, so that the Cu plating layers are recrystallized.
Public/Granted literature
- US20080081200A1 Electronic Device and Method for Manufacturing the Same Public/Granted day:2008-04-03
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