Invention Grant
- Patent Title: Methods for checking and calibrating concentration sensors in a semiconductor processing chamber
- Patent Title (中): 在半导体处理室中检查和校准浓度传感器的方法
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Application No.: US12332796Application Date: 2008-12-11
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Publication No.: US08191397B2Publication Date: 2012-06-05
- Inventor: Francois Doniat , Ronald S. Inman , Nathan Stafford , Axel Soulet , Jean-Louis Marc
- Applicant: Francois Doniat , Ronald S. Inman , Nathan Stafford , Axel Soulet , Jean-Louis Marc
- Applicant Address: US TX Dallas US CA Fremont
- Assignee: Air Liquide Electronics U.S. LP,American Air Liquide, Inc.
- Current Assignee: Air Liquide Electronics U.S. LP,American Air Liquide, Inc.
- Current Assignee Address: US TX Dallas US CA Fremont
- Agent Patricia E. McQueeney
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
The present invention provides methods for checking and calibrating one or more concentration sensors in an open or closed system. More specifically, in one embodiment of the present invention, the disclosed method allows for the checking and calibration of one or more concentration sensors in which removal of the liquid from the system is required. In two additional embodiments, the disclosed methods allow for the checking and calibration of one or more concentration sensors without having to remove the liquid from the closed system thereby minimizing contamination of the system while at the same time greatly reducing or eliminating contact of the user with the liquid.
Public/Granted literature
- US20090151419A1 Methods For Checking And Calibrating Concentration Sensors In A Semiconductor Processing Chamber Public/Granted day:2009-06-18
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