Invention Grant
- Patent Title: Optical method and system for extended depth of focus
- Patent Title (中): 用于延长焦深的光学方法和系统
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Application No.: US12967303Application Date: 2010-12-14
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Publication No.: US08192022B2Publication Date: 2012-06-05
- Inventor: Zeev Zalevsky
- Applicant: Zeev Zalevsky
- Applicant Address: IL Rosh Haayin
- Assignee: Xceed Imaging Ltd.
- Current Assignee: Xceed Imaging Ltd.
- Current Assignee Address: IL Rosh Haayin
- Agency: Browdy and Neimark, PLLC
- Main IPC: G02C7/02
- IPC: G02C7/02

Abstract:
An imaging arrangement and method for extended the depth of focus are provided. The imaging arrangement comprises an imaging lens having a certain affective aperture, and an optical element associated with said imaging lens. The optical element is configured as a phase-affecting, non-diffractive optical element defining a spatially low frequency phase transition. The optical element and the imaging lens define a predetermined pattern formed by spaced-apart substantially optically transparent features of different optical properties. Position of at least one phase transition region of the optical element within the imaging lens plane is determined by at least a dimension of said affective aperture.
Public/Granted literature
- US20110082541A1 OPTICAL METHOD AND SYSTEM FOR EXTENDED DEPTH OF FOCUS Public/Granted day:2011-04-07
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