Invention Grant
- Patent Title: Method of descaling metallic devices
- Patent Title (中): 除锈金属器件的方法
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Application No.: US13232178Application Date: 2011-09-14
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Publication No.: US08192554B2Publication Date: 2012-06-05
- Inventor: Sanjay Shrivastava
- Applicant: Sanjay Shrivastava
- Applicant Address: US IL Abbott Park
- Assignee: Abbott Laboratories
- Current Assignee: Abbott Laboratories
- Current Assignee Address: US IL Abbott Park
- Agency: Workman Nydegger
- Agent John Kwok
- Main IPC: B08B3/00
- IPC: B08B3/00 ; B08B3/10 ; C23G1/00

Abstract:
Methods are provided for descaling metallic component devices such as stents. The devices or components are cleaned under ultrasound in a cleaning solution of ammonium hydrogen fluoride at a temperature within a range of about 60° to 80° C., then rinsed at that temperature with an aqueous rinse containing a nonionic surfactant and rinsed again with purified water.
Public/Granted literature
- US20120000791A1 METHOD OF DESCALING METALLIC DEVICES Public/Granted day:2012-01-05
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