Invention Grant
US08192598B2 End-block for a magnetron device with a rotatable target, and vacuum coating apparatus
有权
具有可旋转靶的磁控管装置的端块和真空镀膜装置
- Patent Title: End-block for a magnetron device with a rotatable target, and vacuum coating apparatus
- Patent Title (中): 具有可旋转靶的磁控管装置的端块和真空镀膜装置
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Application No.: US12504700Application Date: 2009-07-17
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Publication No.: US08192598B2Publication Date: 2012-06-05
- Inventor: Hans-Juergen Heinrich , Goetz Grosser , Sven Haehne , Ulf Seyfert
- Applicant: Hans-Juergen Heinrich , Goetz Grosser , Sven Haehne , Ulf Seyfert
- Applicant Address: DE Dresden
- Assignee: VON ARDENNE Anlagentechnik GmbH
- Current Assignee: VON ARDENNE Anlagentechnik GmbH
- Current Assignee Address: DE Dresden
- Agency: Heslin Rothenberg Farley & Mesiti P.C.
- Priority: DE102008033902 20080718
- Main IPC: C23C14/35
- IPC: C23C14/35

Abstract:
An end block for a magnetron device having a rotatable target comprises an end block housing having a pivot bearing. The end block housing is adapted on its outer side for attachment on a support unit, and the pivot bearing is adapted on an end that is accessible from outside the end block housing, for connection to the rotatable target. The end block housing is movably attached on the support unit. A vacuum coating apparatus has a vacuum chamber, a magnetron device situated in the vacuum chamber, and a rotatable target rotatably mounted on at least one such end block.
Public/Granted literature
- US20100012489A1 END-BLOCK FOR A MAGNETRON DEVICE WITH A ROTATABLE TARGET, AND VACUUM COATING APPARATUS Public/Granted day:2010-01-21
Information query
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