Invention Grant
- Patent Title: Electrolyte and process for depositing a matt metal layer
- Patent Title (中): 用于沉积无光泽金属层的电解质和工艺
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Application No.: US12168680Application Date: 2008-07-07
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Publication No.: US08192607B2Publication Date: 2012-06-05
- Inventor: Andreas Königshofen , Danica Elbick , Christoph Werner , Wolfgang Clauberg , Peter Pies , Andreas Möbius
- Applicant: Andreas Königshofen , Danica Elbick , Christoph Werner , Wolfgang Clauberg , Peter Pies , Andreas Möbius
- Applicant Address: US CT West Haven
- Assignee: Enthone Inc.
- Current Assignee: Enthone Inc.
- Current Assignee Address: US CT West Haven
- Agency: Senniger Powers LLP
- Main IPC: C23C18/36
- IPC: C23C18/36 ; C25D3/56 ; C25D3/12

Abstract:
An electrolytic composition for the deposition of a matt metal layer onto a substrate and deposition process where the composition comprises a source of metal from the group consisting of Cr, Mn, Fe, Co, Ni, Cu, Zn, Ru, Rh, Pd, Ag, In, Sn, Sb, Re, Pt, Au, Bi, and combinations thereof; a substituted or unsubstituted polyalkylene oxide or its derivative as an emulsion and/or dispersion former; and a compound comprising fluorated or perfluorated hydrophobic chains or which is a polyalkylene oxide substituted quaternary ammonium compound as wetting agent; wherein the electrolytic composition forms a microemulsion and/or dispersion.
Public/Granted literature
- US20080302668A1 ELECTROLYTE AND PROCESS FOR DEPOSITING A MATT METAL LAYER Public/Granted day:2008-12-11
Information query
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