Invention Grant
- Patent Title: Integrated semiconductor nonvolatile storage device
- Patent Title (中): 集成半导体非易失性存储装置
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Application No.: US12763402Application Date: 2010-04-20
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Publication No.: US08193053B2Publication Date: 2012-06-05
- Inventor: Digh Hisamoto , Shin'ichiro Kimura , Daiske Okada , Kan Yasui
- Applicant: Digh Hisamoto , Shin'ichiro Kimura , Daiske Okada , Kan Yasui
- Applicant Address: JP Kawasaki-shi
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kawasaki-shi
- Agency: Miles & Stockbridge P.C.
- Priority: JP2005-149296 20050523; JP2006-129887 20060509
- Main IPC: H01L21/336
- IPC: H01L21/336

Abstract:
An object of the present invention is to provide an integrated semiconductor nonvolatile storage device that can be read at high speed and reprogrammed an increased number of times.In the case of conventional nonvolatile semiconductor storage devices having a split-gate structure, there is a tradeoff between the read current and the maximum allowable number of reprogramming operations. To overcome this problem, an integrated semiconductor nonvolatile storage device of the present invention is configured such that memory cells having different memory gate lengths are integrated on the same chip. This allows the device to be read at high speed and reprogrammed an increased number of times.
Public/Granted literature
- US20100203697A1 INTEGRATED SEMICONDUCTOR NONVOLATILE STORAGE DEVICE Public/Granted day:2010-08-12
Information query
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