Invention Grant
US08193076B2 Method for releasing a thin semiconductor substrate from a reusable template
有权
从可重复利用的模板中释放薄的半导体衬底的方法
- Patent Title: Method for releasing a thin semiconductor substrate from a reusable template
- Patent Title (中): 从可重复利用的模板中释放薄的半导体衬底的方法
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Application No.: US12826641Application Date: 2010-06-29
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Publication No.: US08193076B2Publication Date: 2012-06-05
- Inventor: Mehrdad M. Moslehi , David Xuan-Qi Wang , Sam Tone Tor , Karl-Josef Kramer
- Applicant: Mehrdad M. Moslehi , David Xuan-Qi Wang , Sam Tone Tor , Karl-Josef Kramer
- Applicant Address: US CA Milpitas
- Assignee: Solexel, Inc.
- Current Assignee: Solexel, Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Hulsey, P.C.
- Agent William N. Hulsey, III; Loren T. Smith
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
The present disclosure relates to methods and apparatuses template. The method involves forming a mechanically weak layer conformally on a semiconductor template. Then forming a thin for releasing a thin semiconductor substrate from a reusable semiconductor substrate conformally on the mechanically weak layer. The thin semiconductor substrate, the mechanically weak layer and the template forming a wafer. Then defining the border of the thin-film semiconductor substrate to be released by exposing the peripheral of the mechanically weak layer. Then releasing the thin-film semiconductor substrate by applying a controlled air flow parallel to said mechanically weak layer wherein the controlled air flow separates the thin semiconductor substrate and template according to lifting forces.
Public/Granted literature
- US20110021006A1 METHOD FOR RELEASING A THIN SEMICONDUCTOR SUBSTRATE FROM A REUSABLE TEMPLATE Public/Granted day:2011-01-27
Information query
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