Invention Grant
- Patent Title: Method for conductivity control of (Al,In,Ga,B)N
- Patent Title (中): (Al,In,Ga,B)N的电导率控制方法
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Application No.: US11673426Application Date: 2007-02-09
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Publication No.: US08193079B2Publication Date: 2012-06-05
- Inventor: John F. Kaeding , Hitoshi Sato , Michael Iza , Hirokuni Asamizu , Hong Zhong , Steven P. DenBaars , Shuji Nakamura
- Applicant: John F. Kaeding , Hitoshi Sato , Michael Iza , Hirokuni Asamizu , Hong Zhong , Steven P. DenBaars , Shuji Nakamura
- Applicant Address: US CA Oakland
- Assignee: The Regents of the University of California
- Current Assignee: The Regents of the University of California
- Current Assignee Address: US CA Oakland
- Agency: Gates & Cooper LLP
- Main IPC: H01L21/04
- IPC: H01L21/04

Abstract:
A method of controlled p-type conductivity in (Al,In,Ga,B)N semiconductor crystals. Examples include {10 11} GaN films deposited on {100} MgAl2O4 spinel substrate miscut in the direction. Mg atoms may be intentionally incorporated in the growing semipolar nitride thin film to introduce available electronic states in the band structure of the semiconductor crystal, resulting in p-type conductivity. Other impurity atoms, such as Zn or C, which result in a similar introduction of suitable electronic states, may also be used.
Public/Granted literature
- US20070190758A1 METHOD FOR CONDUCTIVITY CONTROL OF (Al,In,Ga,B)N Public/Granted day:2007-08-16
Information query
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