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US08193079B2 Method for conductivity control of (Al,In,Ga,B)N 有权
(Al,In,Ga,B)N的电导率控制方法

Method for conductivity control of (Al,In,Ga,B)N
Abstract:
A method of controlled p-type conductivity in (Al,In,Ga,B)N semiconductor crystals. Examples include {10 11} GaN films deposited on {100} MgAl2O4 spinel substrate miscut in the direction. Mg atoms may be intentionally incorporated in the growing semipolar nitride thin film to introduce available electronic states in the band structure of the semiconductor crystal, resulting in p-type conductivity. Other impurity atoms, such as Zn or C, which result in a similar introduction of suitable electronic states, may also be used.
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