Invention Grant
- Patent Title: Amide group-containing siloxane amine compound
- Patent Title (中): 含酰胺基的硅氧烷胺化合物
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Application No.: US12452957Application Date: 2008-07-28
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Publication No.: US08193295B2Publication Date: 2012-06-05
- Inventor: Tomoyasu Sunaga , Junichi Ishii , Etsuchi Nishikawa
- Applicant: Tomoyasu Sunaga , Junichi Ishii , Etsuchi Nishikawa
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Sony Chemical & Information Device Corporation,Ihara Chemical Industry Co., Ltd.
- Current Assignee: Sony Chemical & Information Device Corporation,Ihara Chemical Industry Co., Ltd.
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2007-216215 20070822
- International Application: PCT/JP2008/063520 WO 20080728
- International Announcement: WO2009/025151 WO 20090226
- Main IPC: C08G77/455
- IPC: C08G77/455

Abstract:
A novel amide group-containing siloxane amine compound, which is useful as a diamine component of a polybenzimidazole resin, a polybenzoxazole resin, and particularly a polyimide resin, which is derived from an amine monomer, has a chemical structure represented by the formula (1). In the formula (1), R1 and R2 each independently represent an optionally substituted alkylene group; p denotes an integer of 0 to 3; q denotes an integer of 0 to 3; m denotes an integer of 1 to 30; and n denotes an integer of 0 to 20; provided that p and q are not 0 at the same time.
Public/Granted literature
- US20100137547A1 NOVEL AMIDE GROUP-CONTAINING SILOXANE AMINE COMPOUND Public/Granted day:2010-06-03
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