Invention Grant
- Patent Title: Near-infrared photodetectors, image sensors employing the same, and methods of manufacturing the same
- Patent Title (中): 近红外光电探测器,采用其的图像传感器及其制造方法
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Application No.: US12656684Application Date: 2010-02-12
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Publication No.: US08193497B2Publication Date: 2012-06-05
- Inventor: Yoon-dong Park , David Andrew Barclay Miller , Young-gu Jin , In-sung Joe
- Applicant: Yoon-dong Park , David Andrew Barclay Miller , Young-gu Jin , In-sung Joe
- Applicant Address: KR Gyeonggi-do US CA Palo Alto
- Assignee: Samsung Electronics Co., Ltd.,The Board of Trustees of the Leland Stanford Junior University
- Current Assignee: Samsung Electronics Co., Ltd.,The Board of Trustees of the Leland Stanford Junior University
- Current Assignee Address: KR Gyeonggi-do US CA Palo Alto
- Agency: Harness, Dickey & Pierce, P.L.C.
- Main IPC: H01L27/148
- IPC: H01L27/148

Abstract:
Silicon photodetectors using near-infrared dipole antennas. The photodetectors include a silicon region formed on a semiconductor substrate, dipole antenna forming two arms that are spaced apart with the silicon region therebetween and inducing an electromagnetic wave signal of incident light, and electrodes disposed in a vertical direction of the dipole antenna and spaced apart with the silicon region therebetween, where a critical bias voltage is applied to the electrodes to induce an avalanche gain operation in the silicon region.
Public/Granted literature
- US20110198499A1 Near-infrared photodetectors, image sensors employing the same, and methods of manufacturing the same Public/Granted day:2011-08-18
Information query
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