Invention Grant
US08193569B2 Non-volatile semiconductor memory device having ion conductive layer and methods of fabricating and operating the same 有权
具有离子传导层的非易失性半导体存储器件及其制造和操作方法

Non-volatile semiconductor memory device having ion conductive layer and methods of fabricating and operating the same
Abstract:
A non-volatile semiconductor memory device having an ion conductive layer, and methods of fabricating and operating the same are disclosed. The non-volatile memory device may include a substrate, a switching element formed in the substrate, and a storage node connected to the switching element, the storage node may include a lower electrode connected to the switching element, and used as an ion source; a data storage layer formed on the lower electrode, a portion thereof being spaced from the lower electrode; a side electrode spaced from the lower electrode, a side surface thereof being connected to a portion of the data storage layer spaced from the lower electrode; and an upper electrode formed on the data storage layer, or may include a lower electrode connected to the switching element, and used as an ion source; and a data storage layer formed on the lower electrode; an upper electrode formed on the data storage layer.
Information query
Patent Agency Ranking
0/0