Invention Grant
- Patent Title: Non-volatile semiconductor memory device having ion conductive layer and methods of fabricating and operating the same
- Patent Title (中): 具有离子传导层的非易失性半导体存储器件及其制造和操作方法
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Application No.: US11508991Application Date: 2006-08-24
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Publication No.: US08193569B2Publication Date: 2012-06-05
- Inventor: Jung-hyun Lee
- Applicant: Jung-hyun Lee
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2005-0078038 20050824
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
A non-volatile semiconductor memory device having an ion conductive layer, and methods of fabricating and operating the same are disclosed. The non-volatile memory device may include a substrate, a switching element formed in the substrate, and a storage node connected to the switching element, the storage node may include a lower electrode connected to the switching element, and used as an ion source; a data storage layer formed on the lower electrode, a portion thereof being spaced from the lower electrode; a side electrode spaced from the lower electrode, a side surface thereof being connected to a portion of the data storage layer spaced from the lower electrode; and an upper electrode formed on the data storage layer, or may include a lower electrode connected to the switching element, and used as an ion source; and a data storage layer formed on the lower electrode; an upper electrode formed on the data storage layer.
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