Invention Grant
- Patent Title: Substrate distortion measurement
- Patent Title (中): 基板失真测量
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Application No.: US11192400Application Date: 2005-07-29
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Publication No.: US08194242B2Publication Date: 2012-06-05
- Inventor: Antonius Theodorus Anna Maria Derksen , Pieter Willem Herman De Jager , Erik Marie Jose Smeets
- Applicant: Antonius Theodorus Anna Maria Derksen , Pieter Willem Herman De Jager , Erik Marie Jose Smeets
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A distortion measurement apparatus comprising a detector arranged to measure distortion of a substrate, and a processor arranged to receive distortion data indicating the measured distortion of the substrate and to transform the distortion data into a frequency domain representation. The distortion data may alternatively be transformed into an orthogonal polynomial or an orthonormal polynomial representation.
Public/Granted literature
- US20070026325A1 Substrate distortion measurement Public/Granted day:2007-02-01
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