Invention Grant
- Patent Title: Method of controlling electron beam focusing of pierce-type electron gun and control apparatus therefor
- Patent Title (中): 控制穿孔式电子枪电子束聚焦的方法及其控制装置
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Application No.: US12446584Application Date: 2007-10-18
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Publication No.: US08198797B2Publication Date: 2012-06-12
- Inventor: Eiichi Iijima , Guo Hua Shen , Tohru Satake
- Applicant: Eiichi Iijima , Guo Hua Shen , Tohru Satake
- Applicant Address: JP Kanagawa
- Assignee: Ulvac, Inc.
- Current Assignee: Ulvac, Inc.
- Current Assignee Address: JP Kanagawa
- Agency: Harness, Dickey & Pierce, PLC
- Priority: JP2006-287658 20061023
- International Application: PCT/JP2007/070352 WO 20071018
- International Announcement: WO2008/050670 WO 20080502
- Main IPC: H01J29/46
- IPC: H01J29/46

Abstract:
[Object] In the control of electron beam focusing of a pierce-type electron gun, any influences from the space charge effect and space charge neutralizing action within the electron gun are eliminated to attain complete control of an electron beam.[Solving Means] Feedback control of the pressure within the electron gun is performed by directly measuring temperature at an internal of the pierce-type electron gun. It is desirable that locations where the direct measurement of the temperature at the internal of the electron gun is performed are an anode (39) and a flow register (43). Further, the direct measurement can be performed at any one of a ring, an aperture and an exhaust pipe provided at an outlet or an inlet of any one of a cathode chamber (31), an intermediate chamber, and a scanning chamber (33). Accordingly, all of stabilization of beam producing area (optimized design of electron gun itself), stabilization of beam transporting portion and stabilization of beam using portion have become appropriate.
Public/Granted literature
- US20100026161A1 Method of Controlling Electron Beam Focusing of Pierce-Type Electron Gun and Control Apparatus Therefor Public/Granted day:2010-02-04
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