Invention Grant
- Patent Title: Method for producing an integrated device
- Patent Title (中): 集成装置的制造方法
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Application No.: US12275276Application Date: 2008-11-21
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Publication No.: US08201325B2Publication Date: 2012-06-19
- Inventor: Laurent A. Dellmann , Michel Despont , Ute Drechsler , Roland M. Guerre
- Applicant: Laurent A. Dellmann , Michel Despont , Ute Drechsler , Roland M. Guerre
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Vazken Alexanian
- Priority: EP07121352 20071122
- Main IPC: H05K3/30
- IPC: H05K3/30

Abstract:
A method for producing an integrated device. A source substrate is provided, the source substrate carrying one or more components to be attached to a receiver surface having a uneven topography. The source substrate includes a deformable layer on a surface on which the one or more components are carried. The source substrate is aligned such that said one or more components carried thereon are associated with contact areas of the receiver surface. The source substrate and the receiver surface are moved towards each other such that the one or more components are brought into contact with the contact areas wherein the deformable layer is at least partially deformed. The source substrate is removed such that the one or more of the components remain located on the contact areas of the receiver surface.
Public/Granted literature
- US20090133914A1 METHOD FOR PRODUCING AN INTEGRATED DEVICE AND A DEVICE PRODUCED THEREBY Public/Granted day:2009-05-28
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