Invention Grant
- Patent Title: Method for manufacturing nozzle substrate, and method for manufacturing droplet discharge head
- Patent Title (中): 喷嘴基板的制造方法以及液滴排出头的制造方法
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Application No.: US12706286Application Date: 2010-02-16
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Publication No.: US08205339B2Publication Date: 2012-06-26
- Inventor: Tomoki Sakashita
- Applicant: Tomoki Sakashita
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Global IP Counselors, LLP
- Priority: JP2009-056036 20090310
- Main IPC: B23P17/00
- IPC: B23P17/00

Abstract:
A method for manufacturing a nozzle substrate includes forming a first hollow recess in a first surface of a silicon substrate, forming a liquid-resistant protective film on the first surface of the silicon substrate including an inner wall of the first hollow recess, forming a second hollow recess in a first surface of a glass substrate, bonding the first surfaces of the silicon substrate and the glass substrate by anodic bonding, reducing a thickness of the glass substrate from a second surface until an aperture is formed in a bottom surface of the second hollow recess to form a second nozzle hole disposed on a droplet feed side, and reducing a thickness of the silicon substrate from a second surface until an aperture is formed in a bottom surface of the first hollow recess to form a first nozzle hole disposed on a droplet discharge side.
Public/Granted literature
- US20100229390A1 METHOD FOR MANUFACTURING NOZZLE SUBSTRATE, AND METHOD FOR MANUFACTURING DROPLET DISCHARGE HEAD Public/Granted day:2010-09-16
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