Invention Grant
- Patent Title: Flow rate control valve
- Patent Title (中): 流量控制阀
-
Application No.: US12134839Application Date: 2008-06-06
-
Publication No.: US08205636B2Publication Date: 2012-06-26
- Inventor: Junya Kuromusha
- Applicant: Junya Kuromusha
- Applicant Address: JP Kyoto
- Assignee: Shimadzu Corporation
- Current Assignee: Shimadzu Corporation
- Current Assignee Address: JP Kyoto
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-202648 20070803
- Main IPC: F16K31/12
- IPC: F16K31/12

Abstract:
In a pressure compensation type flow rate control valve, overshoot of a flow rate when an upstream pressure is abruptly increased is suppressed. A first variable orifice 11 is provided on the side of an inflow opening and a second variable orifice 15 is provided on the side of an outflow opening. As the spool 3 is displaced from its initial position by a pressure of fluid entering when the upstream fluid pressure is increased, the opening of the first variable orifice 11 is gradually reduced, and the opening of the second variable orifice 15 is gradually increased. Since the second variable orifice 15 on the side of the outflow opening is previously reduced, even if the upstream pressure is abruptly increased, fluid more than a predetermined amount does not flow out toward the downstream.
Public/Granted literature
- US20090032117A1 FLOW RATE CONTROL VALVE Public/Granted day:2009-02-05
Information query