Invention Grant
- Patent Title: Evaporation method, evaporation device and method of fabricating light emitting device
- Patent Title (中): 蒸发方法,蒸发装置和制造发光装置的方法
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Application No.: US12487843Application Date: 2009-06-19
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Publication No.: US08206507B2Publication Date: 2012-06-26
- Inventor: Shunpei Yamazaki , Masakazu Murakami
- Applicant: Shunpei Yamazaki , Masakazu Murakami
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Nixon Peabody LLP
- Agent Jeffrey L. Costellia
- Priority: JP2002-143822 20020517
- Main IPC: C23C16/00
- IPC: C23C16/00

Abstract:
The invention provides an evaporation apparatus, which is able to improve an efficiency of evaporation materials, uniformity of deposited films, and throughput of the evaporation process. Disclosed is an evaporation source holder, which is installed in an evaporation chamber and configured to hold an evaporation material, and a moving mechanism, which is configured to move the evaporation source holder during evaporation of the evaporation material. The evaporation apparatus is further characterized by a shutter over the evaporation source holder, a filter over the shutter, and a heater surrounding the filter.
Public/Granted literature
- US20090269486A1 EVAPORATION METHOD, EVAPORATION DEVICE AND METHOD OF FABRICATING LIGHT EMITTING DEVICE Public/Granted day:2009-10-29
Information query
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