Invention Grant
- Patent Title: Cylindrical sputtering target, ceramic sintered body, and process for producing sintered body
- Patent Title (中): 圆柱形溅射靶,陶瓷烧结体和烧结体的制造方法
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Application No.: US11072226Application Date: 2005-03-07
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Publication No.: US08206561B2Publication Date: 2012-06-26
- Inventor: Kenichi Itoh , Hitoshi Mashiko , Tetsuo Shibutami
- Applicant: Kenichi Itoh , Hitoshi Mashiko , Tetsuo Shibutami
- Applicant Address: JP Yamaguchi
- Assignee: Tosoh Corporation
- Current Assignee: Tosoh Corporation
- Current Assignee Address: JP Yamaguchi
- Agency: Sughrue Mion, PLLC
- Priority: JPP.2004-063171 20040305
- Main IPC: C23C14/06
- IPC: C23C14/06

Abstract:
A hollow cylindrical ceramic sintered body having high density, a process for producing the sintered boy, and a cylindrical ceramic sputtering target having high quality without cracks or breakage, are disclosed. The hollow cylindrical ceramic sintered body is obtained by placing a cylindrical ceramic molding to be sintered on a plate-like ceramic molding having a coefficient of sintering shrinkage similar to that of the cylindrical ceramic molding, and then sintering the resulting assembly, thereby obtaining a hollow cylindrical ceramic sintered body having a relative density of 95% or higher. The cylindrical ceramic sputtering target is prepared using the hollow cylindrical ceramic sintered body.
Public/Granted literature
- US20060151321A1 Cylindrical sputtering target, ceramic sintered body, and process for producing sintered body Public/Granted day:2006-07-13
Information query
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