Invention Grant
US08206561B2 Cylindrical sputtering target, ceramic sintered body, and process for producing sintered body 有权
圆柱形溅射靶,陶瓷烧结体和烧结体的制造方法

Cylindrical sputtering target, ceramic sintered body, and process for producing sintered body
Abstract:
A hollow cylindrical ceramic sintered body having high density, a process for producing the sintered boy, and a cylindrical ceramic sputtering target having high quality without cracks or breakage, are disclosed. The hollow cylindrical ceramic sintered body is obtained by placing a cylindrical ceramic molding to be sintered on a plate-like ceramic molding having a coefficient of sintering shrinkage similar to that of the cylindrical ceramic molding, and then sintering the resulting assembly, thereby obtaining a hollow cylindrical ceramic sintered body having a relative density of 95% or higher. The cylindrical ceramic sputtering target is prepared using the hollow cylindrical ceramic sintered body.
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