Invention Grant
- Patent Title: Method of manufacturing magnetic recording medium
- Patent Title (中): 磁记录介质的制造方法
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Application No.: US12838349Application Date: 2010-07-16
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Publication No.: US08206602B2Publication Date: 2012-06-26
- Inventor: Kaori Kimura , Yousuke Isowaki , Yoshiyuki Kamata , Masatoshi Sakurai
- Applicant: Kaori Kimura , Yousuke Isowaki , Yoshiyuki Kamata , Masatoshi Sakurai
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Knobbe, Martens Olson & Bear, LLP
- Priority: JP2009-169252 20090717
- Main IPC: B44C1/22
- IPC: B44C1/22

Abstract:
According to one embodiment, there is provided a method of manufacturing a magnetic recording medium, including forming a first hard mask including carbon as a main component, a second hard mask including a main component other than carbon and a resist on a magnetic recording layer, contacting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues in the recesses of the patterned resist, etching the second hard mask, etching the first hard mask, patterning the magnetic recording layer, and removing the first hard mask, the method further including, between etching the first hard mask and removing the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and removing a contaminating layer on a surface of the first hard mask by a mixed gas of oxygen-based gas and a fluorine compound.
Public/Granted literature
- US20110014496A1 METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM Public/Granted day:2011-01-20
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