Invention Grant
US08206828B2 Material for forming electroless plate and method for forming electroless plate using the same
有权
用于形成无电镀板的材料和使用其形成无电镀板的方法
- Patent Title: Material for forming electroless plate and method for forming electroless plate using the same
- Patent Title (中): 用于形成无电镀板的材料和使用其形成无电镀板的方法
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Application No.: US12224722Application Date: 2007-03-12
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Publication No.: US08206828B2Publication Date: 2012-06-26
- Inventor: Tetsuji Ohta , Mitsuhiro Watanabe
- Applicant: Tetsuji Ohta , Mitsuhiro Watanabe
- Applicant Address: JP JP
- Assignee: Kimoto Co., Ltd.,Japan Surface Treatment Institute Co., Ltd.
- Current Assignee: Kimoto Co., Ltd.,Japan Surface Treatment Institute Co., Ltd.
- Current Assignee Address: JP JP
- Agency: Bacon and Thomas, PLLC
- Priority: JP2006-080942 20060323
- International Application: PCT/JP2007/054848 WO 20070312
- International Announcement: WO2007/108351 WO 20070927
- Main IPC: C25D5/00
- IPC: C25D5/00 ; B32B27/06 ; B32B27/28

Abstract:
A material for electroless plating shows good adhesion for a catalyst and does not cause delamination of a catalyst adhering layer from a non-conductive base material in a catalyst adhering step, development step or other step.In a material for electroless plating, having a catalyst adhering layer on a non-conductive base material, the catalyst adhering layer is formed from a hydrophilic and/or water-soluble resin containing hydroxyl group, and a curable layer formed from a resin having hydroxyl group and an isocyanate type compound is provided between the base material and the catalyst adhering layer. The catalyst adhering layer is preferably formed while isocyanate groups of the isocyanate type compound in the curable layer remain.
Public/Granted literature
- US20090075089A1 Material for Forming Electroless Plate and Method for Forming Electroless Plate Using the Same Public/Granted day:2009-03-19
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