Invention Grant
US08206828B2 Material for forming electroless plate and method for forming electroless plate using the same 有权
用于形成无电镀板的材料和使用其形成无电镀板的方法

Material for forming electroless plate and method for forming electroless plate using the same
Abstract:
A material for electroless plating shows good adhesion for a catalyst and does not cause delamination of a catalyst adhering layer from a non-conductive base material in a catalyst adhering step, development step or other step.In a material for electroless plating, having a catalyst adhering layer on a non-conductive base material, the catalyst adhering layer is formed from a hydrophilic and/or water-soluble resin containing hydroxyl group, and a curable layer formed from a resin having hydroxyl group and an isocyanate type compound is provided between the base material and the catalyst adhering layer. The catalyst adhering layer is preferably formed while isocyanate groups of the isocyanate type compound in the curable layer remain.
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