Invention Grant
US08206890B2 Resist composition, method of forming resist pattern, compound and acid generator
有权
抗蚀剂组合物，形成抗蚀剂图案的方法，化合物和酸发生剂
- Patent Title: Resist composition, method of forming resist pattern, compound and acid generator
- Patent Title (中): 抗蚀剂组合物，形成抗蚀剂图案的方法，化合物和酸发生剂
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Application No.: US12499610Application Date: 2009-07-08
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Publication No.: US08206890B2Publication Date: 2012-06-26
- Inventor: Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
- Applicant: Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2008-184185 20080715; JP2008-271120 20081021; JP2009-123095 20090521
- Main IPC: G03F7/039
- IPC: G03F7/039 ; C07C381/12 ; C07C309/04 ; C07C309/17
Abstract:
A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X− represents an anion; and Rf represents a fluorinated alkyl group.
Public/Granted literature
- US20100015552A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR Public/Granted day:2010-01-21
Information query
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