Invention Grant
- Patent Title: Two-photon absorption material and application thereof
- Patent Title (中): 双光子吸收材料及其应用
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Application No.: US12423475Application Date: 2009-04-14
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Publication No.: US08207330B2Publication Date: 2012-06-26
- Inventor: Tatsuya Tomura , Tsutomu Sato , Takeshi Miki , Mikiko Takada , Hisamitsu Kamezaki
- Applicant: Tatsuya Tomura , Tsutomu Sato , Takeshi Miki , Mikiko Takada , Hisamitsu Kamezaki
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-217276 20080826; JP2009-009719 20090120
- Main IPC: C07B47/00
- IPC: C07B47/00 ; C07D487/22

Abstract:
A two-photon absorption material represented by the following General Formula (I): where R1 to R8 each represent hydrogen, halogen, a carboxyl group, a carboxylic acid ester group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted alkyl group; one to three of X1 to X4 each represent a substituted or unsubstituted amino group, a substituted or unsubstituted aminophenyl group, a substituted or unsubstituted dialkylaminophenyl group, a substituted or unsubstituted N,N-diphenyl-aminophenyl group, a substituted or unsubstituted indolyl group, or a substituted or unsubstituted azulenyl group, and the other represents or the others each represent hydrogen, halogen, a carboxyl group, a carboxylic acid ester group, a substituted or unsubstituted aryl group, a substituted or unsubstituted pyridinyl group, a substituted or unsubstituted alkyl group or a perhalogenoalkyl group; and M represents two hydrogen atoms or a divalent, trivalent or tetravalent metal atom which may have oxygen or halogen.
Public/Granted literature
- US20100056775A1 TWO-PHOTON ABSORPTION MATERIAL AND APPLICATION THEREOF Public/Granted day:2010-03-04
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