Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US12682383Application Date: 2008-09-19
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Publication No.: US08207612B2Publication Date: 2012-06-26
- Inventor: Katsuyuki Torii , Arata Shiomi
- Applicant: Katsuyuki Torii , Arata Shiomi
- Applicant Address: JP Niiza-shi
- Assignee: Sanken Electric Co., Ltd.
- Current Assignee: Sanken Electric Co., Ltd.
- Current Assignee Address: JP Niiza-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-291892 20071109; JP2007-328672 20071220
- International Application: PCT/JP2008/067009 WO 20080919
- International Announcement: WO2009/060670 WO 20090514
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
The present invention provides a semiconductor device and manufacturing method of the semiconductor device which can prevent breaks in an interlayer insulation film (12) and electrode (13) that arise with bonding while maintaining bonding strength. A semiconductor element (1) mounted on a semiconductor device including an interlayer insulation film (12) which has an aperture part (123) having an opening shape which is defined by an extension part (121) which covers the gate electrode (116) and extends in the first direction, a connection part (122), the extension part (121) and the connection part (122) which connects at fixed intervals in the first direction a pair of extension parts (121) which are adjacent to the second direction, and which exposes a main surface of a base region (112) and a main surface of an emitter region (113). Also, a second width dimension (122W) in the first direction below the connection part (122) is larger than a first width dimension (122W) in the second direction of the emitter region (113) below the extension part (121) of the interlayer insulation film (12).
Public/Granted literature
- US20100264546A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2010-10-21
Information query
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