Invention Grant
US08208119B2 Exposure apparatus, exposure method, and method for producing device
有权
曝光装置，曝光方法和制造装置的方法
- Patent Title: Exposure apparatus, exposure method, and method for producing device
- Patent Title (中): 曝光装置，曝光方法和制造装置的方法
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Application No.: US10588297Application Date: 2005-02-03
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Publication No.: US08208119B2Publication Date: 2012-06-26
- Inventor: Naoyuki Kobayashi , Soichi Owa , Shigeru Hirukawa , Yasuhiro Omura
- Applicant: Naoyuki Kobayashi , Soichi Owa , Shigeru Hirukawa , Yasuhiro Omura
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-028092 20040204
- International Application: PCT/JP2005/001990 WO 20050203
- International Announcement: WO2005/076324 WO 20050818
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrate holder (PH), and a temperature adjusting system (60) for adjusting the temperature of the substrate holder (PH). The temperature of the substrate (P) is controlled so that there is no difference in temperature between the substrate (P) and the liquid (LQ), thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid (LQ).
Public/Granted literature
- US20080106707A1 Exposure Apparatus, Exposure Method, and Method for Producing Device Public/Granted day:2008-05-08
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