Invention Grant
US08208121B2 Alignment mark and a method of aligning a substrate comprising such an alignment mark
有权
对准标记和对准包括这种对准标记的基板的方法
- Patent Title: Alignment mark and a method of aligning a substrate comprising such an alignment mark
- Patent Title (中): 对准标记和对准包括这种对准标记的基板的方法
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Application No.: US12363320Application Date: 2009-01-30
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Publication No.: US08208121B2Publication Date: 2012-06-26
- Inventor: Franciscus Godefridus Casper Bijnen , Manfred Gawein Tenner , Patrick Warnaar , Marc Van Kemenade
- Applicant: Franciscus Godefridus Casper Bijnen , Manfred Gawein Tenner , Patrick Warnaar , Marc Van Kemenade
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/58
Abstract:
An alignment mark comprising a periodic structure formed by mark lines is described. In an embodiment, the alignment mark is formed in a scribe lane of a substrate, the scribe lane extending in a scribe lane direction. The alignment mark includes: a first area including a first periodic structure formed by first mark lines extending in a first direction, the first direction being at a first angle α with respect to the scribe lane direction: 0°
Public/Granted literature
- US20090195768A1 Alignment Mark and a Method of Aligning a Substrate Comprising Such an Alignment Mark Public/Granted day:2009-08-06
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