Invention Grant
- Patent Title: Projection optical system and exposure apparatus
- Patent Title (中): 投影光学系统和曝光装置
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Application No.: US12574299Application Date: 2009-10-06
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Publication No.: US08208125B2Publication Date: 2012-06-26
- Inventor: Koji Aoki
- Applicant: Koji Aoki
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2008-261105 20081007
- Main IPC: G02B9/60
- IPC: G02B9/60 ; G03B27/32 ; G03B27/42 ; G03B27/54
Abstract:
An projection optical system for an i-line projection exposure apparatus includes positive, negative, positive, negative and positive lens units which include a lens having an Abbe number equal to or smaller than 62. 0.125≦NAO, −0.251
Public/Granted literature
- US20100085550A1 PROJECTION OPTICAL SYSTEM AND EXPOSURE APPARATUS Public/Granted day:2010-04-08
Information query
