Invention Grant
- Patent Title: Magneto-resistance effect element
- Patent Title (中): 磁阻效应元件
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Application No.: US13243553Application Date: 2011-09-23
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Publication No.: US08208229B2Publication Date: 2012-06-26
- Inventor: Yoshihiko Fuji , Hideaki Fukuzawa , Hiromi Yuasa
- Applicant: Yoshihiko Fuji , Hideaki Fukuzawa , Hiromi Yuasa
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Nixon & Vanderhye, P.C.
- Priority: JP2006-188711 20060707
- Main IPC: G11B5/33
- IPC: G11B5/33

Abstract:
A magneto-resistance effect element, comprising a first magnetic layer, a first metallic layer, which is formed on said first magnetic layer, mainly containing an element selected from the group consisting of Cu, Au, Ag, a current confined layer including an insulating layer and a current path which are made by oxidizing, nitriding or oxynitriding for a second metallic layer, mainly containing Al, formed on said first metallic layer, a functional layer, which is formed on said current confined layer, mainly containing an element selected from the group consisting of Si, Hf, Ti, Mo, W, Nb, Mg, Cr and Zr, a third metallic layer, which is formed on said functional layer, mainly containing an element selected from the group consisting of Cu, Au, Ag; and a second magnetic layer which is formed on said third metallic layer.
Public/Granted literature
- US20120015214A1 MAGNETO-RESISTANCE EFFECT ELEMENT Public/Granted day:2012-01-19
Information query
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